Ion Beam System

Advanced Optics and Electronic Solutions

IBSE 250 / 500 / 700 PACE PlasmaJet 300
Plasma Assisted Chemical Etching
Ultra smoothing of many materials
Ion beam assisted two-target sputtering (coating)
Ion beam etching with constant rate
Highly homogeneous sputter rate
Figuring at normal pressure
Extremely high material removal rates
Sub-Micrometer figuring accuracy
Bombardment of surfaces by fluoric radicals
OptoMill 1500-50 and 1800-70 OLCI2012 Optical Low Coherence Interferometry
Precise figuring of high end optics

Ultra stable removal rates and shapes

Achievable surface
quality

Complete processing and data handing software
High precision optical thickness measurement
Measurement of transparent material
Accuracy of thickness measurement
Parallelism measurement of thick plates

10-0808 - Ion Beam System photo

Ion Beam System

RETC

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